| 发明名称 |
Probe Head Manufacturing Method |
| 摘要 |
A beam ( 32 ) of a probe bead ( 30 ) having a uniform thickness is formed by using a silicon layer ( 64 ) of a SOI substrate. The beam of the probe head is formed by growing a boron-doped diamond and non-doped diamond on a processing substrate, respectively.
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| 申请公布号 |
US2008017609(A1) |
申请公布日期 |
2008.01.24 |
| 申请号 |
US20050628313 |
申请日期 |
2005.06.01 |
| 申请人 |
TAKAHASHI HIROKAZU;ONO TAKAHITO;ESASHI MASAYOSHI |
发明人 |
TAKAHASHI HIROKAZU;ONO TAKAHITO;ESASHI MASAYOSHI |
| 分类号 |
B44C1/22;G01Q10/00;G01Q70/14;G01Q70/16;G01Q80/00 |
主分类号 |
B44C1/22 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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