| 摘要 |
A vortex mask comprises a substrate, a first phase region positioned on the substrate, a second phase region surrounding the first phase region, and a third phase region positioned on the substrate and connected to the first phase region and the second phase region. When exposure beams penetrate the first phase region, the second phase region and the third region of the vortex mask, there will be 90 degrees of phase difference from each other. In addition, the first phase region and the third phase region can be positioned in a mirror image manner, and the third phase region connects to the first phase region and the second phase region in a point manner, which can be used to define the shape of a circular pattern.
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