发明名称 PHOTOSENSITIVE RESIN COMPOSITION
摘要 <p>Disclosed is a photosensitive resin composition containing a cationic photopolymerization initiator (A) composed of sulfonium tris(pentafluoroethyl)trifluorophosphate and an alkali-soluble epoxy compound (B) which is obtained by reacting a polybasic acid anhydride (c) with a reaction product (I) between an epoxy compound (a) having two or more epoxy groups in a molecule and a compound (b) having one or more carboxyl groups and one or more hydroxyl groups in a molecule.</p>
申请公布号 WO2008010521(A1) 申请公布日期 2008.01.24
申请号 WO2007JP64192 申请日期 2007.07.18
申请人 NIPPON KAYAKU KABUSHIKI KAISHA;MICROCHEM CORP.;HONDA, NAO;MORI, SATOSHI;MILLER, HARRIS 发明人 HONDA, NAO;MORI, SATOSHI;MILLER, HARRIS
分类号 G03F7/029;C08G59/32;G03F7/004;G03F7/032;G03F7/038 主分类号 G03F7/029
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