发明名称 |
METHOD OF SMOOTHING SURFACE OF GLASS SUBSTRATE |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method of smoothing a surface of a substrate which has a recessed defect such as a pit or a scratch. <P>SOLUTION: The method of smoothing a surface of a glass substrate is a method of smoothing the surface of a glass substrate employed for a reflective mask blank for EUV lithography and is characterized by: a step of forming a thin film on a glass substrate; a step of detecting a recessed defect present on the glass substrate; and a step of locally heating the portion of the thin film present directly on the detected recessed defect or locally anodizing the portion of the thin film to cause a chemical reaction which involves a volume increase in the material that composes the thin film. <P>COPYRIGHT: (C)2008,JPO&INPIT |
申请公布号 |
JP2008016823(A) |
申请公布日期 |
2008.01.24 |
申请号 |
JP20070119043 |
申请日期 |
2007.04.27 |
申请人 |
ASAHI GLASS CO LTD |
发明人 |
SUGIYAMA TAKASHI;IKUTA YORISUKE;ITO MASABUMI |
分类号 |
H01L21/027;C03C17/245;G03F1/22;G03F1/24 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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