发明名称 |
Measurement of a scattered light point spread function (PSF) for microelectronic photolithography |
摘要 |
A scattered light point spread function is measured for use in fabricating microelectronic and micromechanical devices using photolithography. In one example, a photosensitive layer of a microelectronic substrate is exposed through a test mask, the test mask having a series of differently sized patterns, each pattern surrounding a central monitor feature, the differently sized patterns each being evenly distributed about its respective central monitor feature. An indication of the exposure of the photosensitive layer is measured for a plurality of the series of differently sized patterns. The exposure indication is compared to the pattern size. The comparison is fitted to a function and the function is applied in correcting photolithography mask layouts.
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申请公布号 |
US2008020292(A1) |
申请公布日期 |
2008.01.24 |
申请号 |
US20060490924 |
申请日期 |
2006.07.21 |
申请人 |
GARDINER ALLEN B;JEONG SEONGTAE;CONTE MARIE T;CHANDHOK MANISH;KENYON CHRIS |
发明人 |
GARDINER ALLEN B.;JEONG SEONGTAE;CONTE MARIE T.;CHANDHOK MANISH;KENYON CHRIS |
分类号 |
G03C5/00;G03F1/00;H01L23/58;H01L29/10 |
主分类号 |
G03C5/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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