| 摘要 |
A method and system for preventing the deposit of residues on a substrate. Aspects of the system are modified in order to prevent the deposit of residue of substrates. In particular, gaps located within the system between the splash guard and the process chamber wall are closed, minimized and/or given a non-linear shape so as to prevent the deposit of materials back onto the substrate. In one aspect, the invention is a system for processing a substrate comprising: a rotary support for supporting a substrate in a substantially horizontal orientation, the rotary support adapted to rotate about an axis of rotation; a wall circumferentially surrounding the rotary support about the axis of rotation, the wall extending above and below a top surface of a substrate positioned on the rotary support; a splash guard circumferentially surrounding the rotary support about the axis of rotation, the splash guard positioned between the rotary support and the wall so that an annular gap exists between an outer surface of the splash guard and an inner surface of the wall structure; a structure extending upward from the outer surface of the splash guard, the structure adapted to prohibit droplets carried upward through the gap by air flow from depositing on a substrate on the rotary support.
|
