发明名称 Method of producing bonded wafer
摘要 <p>There is provided a method of producing a bonded wafer by bonding two silicon wafers for active layer and support layer to each other and then thinning the wafer for active layer, in which nitrogen ions are implanted from the surface of the wafer for active layer to form a nitride layer in the interior of the wafer for active layer before the bonding. </p>
申请公布号 EP1870930(A3) 申请公布日期 2008.01.23
申请号 EP20070011061 申请日期 2007.06.05
申请人 SUMCO CORPORATION 发明人 NISHIHATA, HIDEKI;MORIMOTO, NOBUYUKI;ENDO, AKIHIKO
分类号 H01L21/762 主分类号 H01L21/762
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