发明名称 PVD cylindrical target
摘要 <p>The present invention provides a PVD cylindrical target comprising an evaporation material covering the outer circumferential surface of a cylindrical substrate, the PVD cylindrical target includes a meshing part having at least either of a protruding shape and a recessed shape formed with rounded angular parts at the interface between the substrate and the evaporation material. According to such a structure, peeling or cracking of the evaporation material by a residual stress caused at the interface between the substrate and the evaporation material by a thermal expansion difference between the both can be suppressed, and sufficient adhesiveness between the both can also be ensured. </p>
申请公布号 EP1873274(A3) 申请公布日期 2008.01.23
申请号 EP20070111291 申请日期 2007.06.28
申请人 KABUSHIKI KAISHA KOBE SEIKO SHO (KOBE STEEL, LTD.) 发明人 TAKAO, TOSHIAKI;OKAZAKI, TAKAHIRO;FUJII, HIROFUMI
分类号 C23C14/34;H01J37/34 主分类号 C23C14/34
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