发明名称 System for correcting the non-uniformity of illumination in a photolithography device
摘要 <p>A system and method for uniformity correction having light leak and shadow compensation is provided. The system includes multiple correction elements (250) and an optical compensation plate (220a-n,222a-n). Adjacent correction elements are separated by a gap (250). The optical compensation plate (225a-n) includes a pattern having multiple gap compensation segments. The pattern has an attenuation which is different than the attenuation of the remaining portions of the optical compensation plate (250). The location of each compensation segment on the compensation plate (250) corresponds to the location of the corresponding gap between adjacent correction elements (220a-n,222a-n) in the illumination slot. The width of each compensation segment is dependent upon the angle of the light incident on the correction system. The pattern can be located on the top surface or on the bottom surface of the compensation plate (250). In addition, the compensation plate (220a-n,222a-n) can be located above or below the plurality of correction elements (250). </p>
申请公布号 EP1677148(A3) 申请公布日期 2008.01.23
申请号 EP20050027804 申请日期 2005.12.19
申请人 NL 发明人 US
分类号 G03F7/20;G02B27/09;G02F1/1335 主分类号 G03F7/20
代理机构 代理人
主权项
地址