| 发明名称 |
Method of manufacturing ferroelectric layer and method of manufacturing electronic device |
| 摘要 |
<p>A method of manufacturing a ferroelectric layer, including: forming a first ferroelectric layer above a base by a vapor phase method; and forming a second ferroelectric layer above the first ferroelectric layer by a liquid phase method.
</p> |
| 申请公布号 |
EP1729333(A3) |
申请公布日期 |
2008.01.23 |
| 申请号 |
EP20060009304 |
申请日期 |
2006.05.05 |
| 申请人 |
SEIKO EPSON CORPORATION |
发明人 |
KIJIMA, TAKESHI |
| 分类号 |
H01L21/316;B41J2/045;B41J2/055;B41J2/135;B41J2/14;B41J2/16;H01L21/02;H01L21/8246;H01L27/105;H01L41/09;H01L41/18;H01L41/187;H01L41/316;H01L41/317;H01L41/319;H01L41/39 |
主分类号 |
H01L21/316 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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