GRADED ARC FOR HIGH NA AND IMMERSION LITHOGRAPHY

摘要

A graded ARC(Anti-Reflective Coating) for a high NA(Numerical Aperture) and an immersion lithography is provided to reduce reflectivity of light from an incident angle not perpendicular. A method for forming a device includes the steps of: forming one or more amorphous carbon layers(204) on a substrate(200); forming an ARC layer(206) on the one or more amorphous carbon layers, wherein the ARC layer has an absorption coefficient to vary according to the thickness of the ARC layer; forming a first layer of an energy sensitive resist material(208) on the ARC layer; introducing an image of a pattern to the first layer of the energy sensitive resist material by exposing the energy sensitive resist material to patterned light; and developing the image of the pattern introduced to the first layer of the energy sensitive resist material.