METHOD FOR ALIGNMENT SEMICONDUCTOR DEVICE

摘要

A method for aligning a semiconductor device is provided to reduce a time of performing an exposure process again due to failure of alignment. A method for aligning a semiconductor device includes the steps of: aligning a sample mask with a first alignment light of an existing exposure recipe(S110); selecting a second alignment light after measuring wafer quality by using alignment lights with colors and orders different from that of the first alignment light in case of failure of the alignment(S115); storing the second alignment light in a database; and aligning a main mask by using the second alignment light(S130), wherein the alignment process uses an alignment mark.