BEAM STOP FOR AN ION IMPLANTER

摘要

A beam stop apparatus for an ion implanter is provided to shape and steer an ion beam in response to signals supplied from an electric charge collector and an electric charge collection baffle. A beam stop apparatus(100) for an ion implanter includes an electric charge collector having a segmented surface for receiving an ion beam. The surface is divided into at least two segments. One segment is extended around the other segments. Each of the two segments is operable to supply one or more signals for indicating electric charges collected by the segment in an incident state of the ion beam. The surface is divided into at least two concentrically arranged segments. The concentrically arranged segments include annular segments. The annular segments are extended around central circular segments.