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发明名称
PHOTOSENSITIVE RESIN COMPOSITION FOR LASER ENGRAVABLE PRINTING SUBSTRATE
摘要
申请公布号
KR100796869(B1)
申请公布日期
2008.01.22
申请号
KR20067017161
申请日期
2006.08.25
申请人
发明人
分类号
G03F7/075;B41C1/05;B41C1/10;B41N1/12;G03F7/00;G03F7/004;G03F7/027;G03F7/035;G03F7/038
主分类号
G03F7/075
代理机构
代理人
主权项
地址
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