发明名称 A HEAT TREATMENT EQUIPMENT
摘要 <p>A thermal treatment apparatus is provided to minimize the amount of ambient gas used for thermal treatment and suppress environmental pollution due to combustion of the ambient gas, by controlling the supply and exhaust of the ambient gas using an adsorption valve and an exhaust valve. An adsorption valve(91a) and an exhaust valve(131a) are respectively installed on an ambient gas supply pipe(91) and an exhaust pipe(131), which are connected to a heating room(12). A pressure sensor(150) is mounted on the heating room. A control unit(80) is connected to the pressure sensor, the adsorption valve, and the exhaust valve. The control unit controls the operation of the adsorption valve and the exhaust valve respectively, thereby supplying ambient gas to the heating room and exhausting the ambient gas from a cooling room(13). Further, a storage tank for storing ambient gas generated from an ambient supplying device in the ambient gas supply pipe.</p>
申请公布号 KR100796767(B1) 申请公布日期 2008.01.22
申请号 KR20070020360 申请日期 2007.02.28
申请人 CHOI, BYUNG GIL 发明人 CHOI, BYUNG GIL
分类号 B01J19/00;B01J19/30;C21D1/00;C21D9/00 主分类号 B01J19/00
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