发明名称 Semiconductor laser device and method for fabricating the same
摘要 A semiconductor laser device of the present invention includes: an active layer formed on a substrate; a first semiconductor layer formed on the active layer and made of a nitride semiconductor of a first conductivity type; a multilayer film formed on the first semiconductor layer and having a groove; and a second semiconductor layer formed on the multilayer film to fill the groove and made of a nitride semiconductor of the first conductivity type. The multilayer film is composed of a plurality of thin films containing a nitride semiconductor of a second conductivity type, and one of the thin films formed as the uppermost film is made of gallium nitride.
申请公布号 US7320898(B2) 申请公布日期 2008.01.22
申请号 US20050154547 申请日期 2005.06.17
申请人 MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. 发明人 TAMURA SATOSHI;IKEDO NORIO
分类号 H01L21/00;H01L29/06;H01S5/20;H01S5/22;H01S5/343 主分类号 H01L21/00
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