发明名称 GRAFT PATTERN FORMING METHOD AND CONDUCTIVE PATTERN FORMING METHOD
摘要 <p>The invention provides a graft pattern forming method including contacting a radical-polymerizable unsaturated compound with a surface of a base material capable of generating radicals by exposure; and exposing imagewise with laser light having a wavelength of 360 to 700 nm to form a graft polymer directly bonded to the base material patternwise on the surface of the base material. The invention also provides a conductive pattern forming method including imparting conductivity to the graft pattern formed patternwise obtained by the graft pattern forming method.</p>
申请公布号 KR20080007379(A) 申请公布日期 2008.01.18
申请号 KR20077027200 申请日期 2007.11.22
申请人 FUJI FILM CORPORATION 发明人 KAWAMURA KOICHI;MATSUSHITA YASUAKI
分类号 H01L21/027 主分类号 H01L21/027
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