发明名称 |
GRAFT PATTERN FORMING METHOD AND CONDUCTIVE PATTERN FORMING METHOD |
摘要 |
<p>The invention provides a graft pattern forming method including contacting a radical-polymerizable unsaturated compound with a surface of a base material capable of generating radicals by exposure; and exposing imagewise with laser light having a wavelength of 360 to 700 nm to form a graft polymer directly bonded to the base material patternwise on the surface of the base material. The invention also provides a conductive pattern forming method including imparting conductivity to the graft pattern formed patternwise obtained by the graft pattern forming method.</p> |
申请公布号 |
KR20080007379(A) |
申请公布日期 |
2008.01.18 |
申请号 |
KR20077027200 |
申请日期 |
2007.11.22 |
申请人 |
FUJI FILM CORPORATION |
发明人 |
KAWAMURA KOICHI;MATSUSHITA YASUAKI |
分类号 |
H01L21/027 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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