| 摘要 |
A silicon-containing anti-reflective film composition is provided to obtain an extended life as a crown ether compound collects water moisture to prevent a cross-linking reaction, and thus achieve stabilization of a lithography process. A silicon-containing anti-reflective film composition includes a crown ether compound having an ethyleneoxy group in the molecule. The crown ether compound is a compound having a molecular structure represented by the following formula 1, wherein n is an integer of 1-5 and each of R1 to R4 is H, OH, COOH, or a C1-C5 alkyl group. The compound represented by the formula 1 is contained in a range of 0.01-1wt% based on the total composition. |
