IMMERSION LITHOGRAPHY EXPOSURE SYSTEM, AND FOREIGN MATTER DETECTING METHOD WITHIN THE SYSTEM (ILLUMINATION LIGHT IN IMMERSION LITHOGRAPHY STEPPER FOR PARTICLE OR BUBBLE DETECTION)

摘要

PROBLEM TO BE SOLVED: To provide an illumination light in an immersion lithography stepper for particle or bubble detection.

SOLUTION: Embodiments provide an immersion lithography exposure system comprising a wafer holder for holding a wafer, an immersion liquid for covering the wafer, an immersion head to dispense and contain the immersion liquid, and a light source adapted to lithographically expose a resist on the wafer. The system also comprises a light detector at a first location of the immersion head and a laser source at a second location within the immersion head.

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