Method for cleaning a glass substrate, method for fabricating a glass substrate, and magnetic disk using the same

摘要

A method for cleaning a glass substrate containing SiO₂ as a main ingredient thereof ensuring removal of abrasive and foreign matter adhered to the glass substrate after a polishing step, without complicating a cleaning step, including a process in which the glass substrate is cleaned by scrubbing using a liquid having Si element stationary in a range from 1 to 5 000 ppb/mm².