摘要 |
Stage devices are disclosed for various uses including use as a reticle stage or substrate stage in a microlithography system. An exemplary device includes a carrier and multiple linear EM actuators that couple the carrier monolithically to a base. The linear EM actuators collectively provide controlled movability of the carrier relative to the base in all six DOFs (X, Y, Z, theta<SUB>X</SUB>, theta<SUB>Y</SUB>, theta<SUB>Z</SUB>). The multiple linear EM actuators comprise at least one multiple-DOF linear actuator but fewer than six linear EM actuators. For example, the stage device can have two two-DOF linear actuators providing respective motions of the carrier in the X, Y and Y, Z DOFs (and collectively in all six DOFs) or can have two two-DOF linear actuators providing motions of the carrier in the Y, Z, theta<SUB>X</SUB>, theta<SUB>Y</SUB>, and theta<SUB>Z </SUB>DOFs and a one-DOF linear actuator providing motions in the X DOF.
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