APPARATUS FOR TREATING SUBSTRATES AND METHOD FOR DRYING SUBSTRATES

摘要

An apparatus for treating a substrate and a method for drying a substrate are provided to enhance dry efficiency by improving drying errors in a center part of the substrate. A substrate is loaded on a rotatable substrate supporting member. The substrate supporting member is used for supporting and rotating the substrate. A gas injection member is formed to inject a drying gas onto the substrate which is loaded on the substrate supporting member. A flow path(143) is formed in the inside of the gas injection member in order to transfer the dry gas from a center part to a peripheral part of the gas injection member. A first gas supply member is formed to supply the dry gas into the center part of the gas injection member. A second gas supply member is formed to supply the dry gas into the peripheral part of the gas injection member.