发明名称 Dual hexagonal shaped plasma source
摘要 A plasma source includes a hexagonal hollow cathode, the cathode including six targets and six magnets to generate and maintain a high density plasma; and an anode located beneath the cathode. A second hexagonal hollow cathode can be positioned concentric to the hexagonal hollow cahode.
申请公布号 US2008011600(A1) 申请公布日期 2008.01.17
申请号 US20060486471 申请日期 2006.07.14
申请人 NAGASHIMA MAKOTO 发明人 NAGASHIMA MAKOTO
分类号 C23C14/00;C23C14/32 主分类号 C23C14/00
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