| 摘要 |
PROBLEM TO BE SOLVED: To provide a metal mask in which an opening width can be made narrower compared with a conventional one even if manufactured using the same pattern accuracy as a photoresist. SOLUTION: The metal mask 11 is constituted of three layers of metal layers 12, 13, 14, and the center metal layer 13 is formed in a mesh state. The metal layers 12, 14 installed on both sides by pinching the metal layer 13 has striped openings 12a, 14a respectively formed with the same width W. The three layers of the metal layers 12, 13, 14 are laminated in a state that one part of the respective openings 12a, 14a are overlapped, and laminated so that the overlapped parts will form a through hole 15 of the target width Wp. The metal mask 11 is formed of a metal having a small thermal expansion coefficient, for example, of invar. Moreover, surface treatment to improve etching resistance is applied on the metal mask 11. COPYRIGHT: (C)2008,JPO&INPIT
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