发明名称 Method for horizontally electroplating, electro deposition and electroless-plating thin film on substrate
摘要 A method for horizontally electroplating or electro deposition a thin film on a substrate comprises the steps of transferring and positioning a substrate on a substrate supporter; the substrate being positioned approximately horizontally; moving a plurality of stop plates to enclose horizontal edges of the substrate so as to form with an enclosure around an edge of the substrate; moving a first electrode to be in contact with a portion of the substrate; the portion being a non-wired area; moving a second electrode to be above and not in contact with the substrate; wherein the second electrode has a polarity opposite to that of the first electrode; and filling electroplating liquid into the enclosure formed by the stop plates so as to be in contact with the second electrode above the substrate for electroplating or electro deposition.
申请公布号 US2008011611(A1) 申请公布日期 2008.01.17
申请号 US20060487122 申请日期 2006.07.17
申请人 发明人 LIAO YEN-CHEN
分类号 C25D5/02 主分类号 C25D5/02
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