发明名称 ION IMPLANT SYSTEM AND INTER-LOCK METHOD THEREOF
摘要 An ion implantation system and an inter-lock method of the same are provided to detect an ion implantation error by setting a dual interlock condition to a mass analyzer. An ion implantation system includes a mass analyzer(1), a power supply unit(5), a control unit(10), and a current sensing unit(15). The power supply unit supplies current to the mass analyzer. The control unit is electrically connected to the power supply unit. The current sensing unit senses the current from the power supply unit to the mass analyzer and transmits information related to the sensed current to the control unit. The control unit compares the sensed current information with the reference current information in order to generate an inter-lock signal for interrupting an operation of ion implantation equipment.
申请公布号 KR20080007020(A) 申请公布日期 2008.01.17
申请号 KR20060066498 申请日期 2006.07.14
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 KIM, HYEONG YONG;LEE, YONG BEOM;PARK, WOON KI;CHA, KWANG HO;JEONG, HYEOK JIN
分类号 H01J37/30 主分类号 H01J37/30
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