| 发明名称 |
PATTERN INSPECTION DEVICE, PATTERN INSPECTION METHOD, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE |
| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a pattern inspection device capable of inspecting a pattern with high resolution even when the dimension of an inspection object is the wavelength of inspection light or smaller, and to provide a pattern inspection method and a method for manufacturing semiconductor device. <P>SOLUTION: The pattern inspection device is equipped with: at least one of a first projection system for inspection by transmission light and a second projection system for inspection by reflection light; an inspection optical system for picking up the image of the pattern on an inspection object; a stage for placing and moving the inspection object; and a diffracted light control means for enhancing the light diffracted by the pattern. <P>COPYRIGHT: (C)2008,JPO&INPIT</p> |
| 申请公布号 |
JP2008009339(A) |
申请公布日期 |
2008.01.17 |
| 申请号 |
JP20060182547 |
申请日期 |
2006.06.30 |
| 申请人 |
TOSHIBA CORP |
发明人 |
INOUE HIROSHI;WATANABE TOMOHIDE;YOSHIKAWA RYOJI |
| 分类号 |
G01N21/956;G03F1/84;H01L21/027 |
主分类号 |
G01N21/956 |
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