| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a nanoimprint composition which has high heat resistance and does not allow a formed relief pattern to easily disappear by heating and to easily and efficiently produce the formation of a relief pattern in the nanoimprint composition. <P>SOLUTION: The nanoimprint composition comprises a polyamic acid (B) and an epoxy resin (C). The nanoimprint composition comprises a polyester-polyamic acid (A1) and the epoxy resin (C). <P>COPYRIGHT: (C)2008,JPO&INPIT</p> |
