发明名称 |
ORGANIC INORGANIC PHOTOSENSITIVE RESIN COMPOSITION |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive transparent resin composition having 260°C reflow heat resistance useful for producing a solid image pickup element or an electronic part-integrated type product requiring a solder reflow step at 260°C and having excellent characteristics even of adhesiveness, elongation and temperature impact resistance other than the heat resistance and to provide a micro-plastic lens or an optical element for a liquid crystal polarizing plate using the photosensitive transparent resin composition. <P>SOLUTION: The photosensitive transparent resin composition comprises a resin obtained by carrying polycondensation of compounds containing organosilanes composed of three elements of a specific combination in the presence of a catalyst at 40 to ≤150°C temperature for 0.1-10 h. A method for producing the micro-plastic lens or optical element for the liquid crystal polarizing plate using the composition is provided. <P>COPYRIGHT: (C)2008,JPO&INPIT |
申请公布号 |
JP2008007641(A) |
申请公布日期 |
2008.01.17 |
申请号 |
JP20060179679 |
申请日期 |
2006.06.29 |
申请人 |
ASAHI KASEI ELECTRONICS CO LTD |
发明人 |
KOBAYASHI TAKAAKI |
分类号 |
C08G85/00;C08G77/20;G02B3/00;G02F1/1335;G03F7/075 |
主分类号 |
C08G85/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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