发明名称 ORGANIC INORGANIC PHOTOSENSITIVE RESIN COMPOSITION
摘要 <P>PROBLEM TO BE SOLVED: To provide a photosensitive transparent resin composition having 260&deg;C reflow heat resistance useful for producing a solid image pickup element or an electronic part-integrated type product requiring a solder reflow step at 260&deg;C and having excellent characteristics even of adhesiveness, elongation and temperature impact resistance other than the heat resistance and to provide a micro-plastic lens or an optical element for a liquid crystal polarizing plate using the photosensitive transparent resin composition. <P>SOLUTION: The photosensitive transparent resin composition comprises a resin obtained by carrying polycondensation of compounds containing organosilanes composed of three elements of a specific combination in the presence of a catalyst at 40 to &le;150&deg;C temperature for 0.1-10 h. A method for producing the micro-plastic lens or optical element for the liquid crystal polarizing plate using the composition is provided. <P>COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008007641(A) 申请公布日期 2008.01.17
申请号 JP20060179679 申请日期 2006.06.29
申请人 ASAHI KASEI ELECTRONICS CO LTD 发明人 KOBAYASHI TAKAAKI
分类号 C08G85/00;C08G77/20;G02B3/00;G02F1/1335;G03F7/075 主分类号 C08G85/00
代理机构 代理人
主权项
地址