发明名称 Semiconductor Devices
摘要 The dense accumulation of hole carriers can be obtained over a wide range of a semiconductor region in a floating state formed within a body region of an IGBT. An n type semiconductor region ( 52 ) whose potential is floating is formed within a p<SUP>-</SUP> type body region ( 28 ). The n type semiconductor region ( 52 ) is isolated from an n<SUP>+</SUP> type emitter region ( 32 ) and an n<SUP>-</SUP> type drift region ( 26 ) by the body region ( 28 ). Furthermore, a second electrode ( 62 ) is formed, so as to oppose to at least a part of the semiconductor region ( 52 ) via an insulator film ( 64 ). The second electrode ( 62 ) does not oppose to the emitter region ( 32 ).
申请公布号 US2008012040(A1) 申请公布日期 2008.01.17
申请号 US20050596063 申请日期 2005.05.12
申请人 KABUSHIKI KAISHA TOYOTA CHUO KENKYUSHO;TOYOTA JIDOSHA KABUSHIKI KAISHA 发明人 SAITO JUN;HOTTA KOJI;KAWAJI SACHIKO;ISHIKO MASAYASU;SUGIYAMA TAKAHIDE;USUI MASANORI
分类号 H01L29/739;H01L29/78;H01L29/80 主分类号 H01L29/739
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