发明名称 SURFACE POSITION DETECTING APPARATUS, EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD
摘要 <p>A surface position detecting apparatus is provided with a light transmitting optical system (SL) for guiding light to a surface (W) to be detected; a light receiving optical system (RL) for guiding the light to a light receiving surface; a detecting means (38) arranged on the light receiving surface; a splitting means (4) for performing view filed splitting to the light guided to the surface (W) into measuring light and reference light; and a composing means (5) for performing view field composition to the measuring light traveling toward the light receiving optical system (RL) through the surface (W) and the reference light traveling toward the light receiving optical system (RL) not through the surface (W). The detecting means (38) independently detects the reference light and the measuring light on the light receiving surface.</p>
申请公布号 WO2008007765(A1) 申请公布日期 2008.01.17
申请号 WO2007JP63957 申请日期 2007.07.13
申请人 NIKON CORPORATION;HIDAKA, YASUHIRO 发明人 HIDAKA, YASUHIRO
分类号 H01L21/027;G01B11/00;G03F7/20 主分类号 H01L21/027
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