| 摘要 |
A substrate cleaning apparatus and a cleaning method using the same are provided to suppress corrosion of a transfer unit and peripheral equipment by preventing an inflow of chemicals from a cleaning treatment part to a substrate transfer part. A cleaning treatment part(300) includes an array of process chambers for cleaning substrates. A substrate transfer part(400) is arranged adjacently to the cleaning treatment part. The substrate transfer part includes a transfer robot for loading the substrates into the process chambers and unloading the substrates from the process chambers and a track portion for moving the transfer robot along the process chambers. A rectification plate(500) has a barrier rib structure for separating the cleaning treatment part and the substrate transfer part from each other and includes a transferring path for moving vertically the transfer robot in a substrate loading/unloading process. An air curtain unit forms an air curtain in the transferring path in order to block the inflow of chemicals through the transferring path to the substrate transferring part.
|
