发明名称 METHOD FOR MANUFACTURING HEAT DEVELOPABLE PHOTOSENSITIVE MATERIAL AND HEAT DEVELOPABLE PHOTOSENSITIVE MATERIAL MANUFACTURED BY THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a method for manufacturing a heat developable photosensitive material with a low impact on the environment, and a heat developable photosensitive material manufactured by the same. SOLUTION: In the method for manufacturing a heat developable photosensitive material containing at least a photosensitive silver halide, a non-photosensitive organic silver salt and a reducing agent for the organic silver salt on one surface of a support, the heat developable photosensitive material contains a polymer dispersion containing≥0.01 mass% of a surfactant of which the biochemical oxygen demand (BOD) is≥60% of theoretical oxygen demand (ThOD) and 10-500 ppm of a preservative. The manufacturing method includes at least a step of storing such a polymer dispersion in a container, a step of drawing the polymer dispersion from the container and preparing a coating liquid, and a step of applying and drying the coating liquid, wherein a sterilized container is used as the container for storing the polymer dispersion. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008009307(A) 申请公布日期 2008.01.17
申请号 JP20060182056 申请日期 2006.06.30
申请人 FUJIFILM CORP 发明人 FUSHIMI HIDEO
分类号 G03C1/498;G03C1/74 主分类号 G03C1/498
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