摘要 |
There is provided an optical imaging device, in particular for microlithography, comprising at least one optical element and at least one holding device associated to the optical element ( 109 ), wherein the holding device holds the optical element and a first part ( 109.1 ) of the optical element contacts a first atmosphere and a second part ( 109.2 ) of the optical element at least temporarily contacts a second atmosphere. There is provided a reduction device at least reducing dynamic fluctuations in the pressure difference between the first atmosphere and the second atmosphere.
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