FILM COMPOSITION DEPOSITED ON SUBSTRATE, AND ITS SEMICONDUCTOR DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a film composition deposited on a substrate and its semiconductor device. SOLUTION: An initiation layer is formed by exposing a substrate to at least an adhesive material enough to be adsorbed by the material on the substrate. The initiation layer gives a first reactive region. The reactive region is made to chemically react with the first reactive material under an atomic layer deposition condition to form a second reactive region. The second reactive region is made to chemically react with a second reactive material under a process condition enough to form a reactive layer on the initiation layer. This process is repeated to form a continuous reactive layer on the initiation layer. The adhesive material comprising the initiation layer is used that does not deteriorate by atomic layer deposition method. The initiation layer forms a final film together with one or a plurality of reactive layers. COPYRIGHT: (C)2008,JPO&INPIT