| 摘要 |
PROBLEM TO BE SOLVED: To provide a marking method capable of easily specifying the position of a defective element. SOLUTION: The marking method is a process for forming an index for analyzing the defect in an imaging apparatus having a plurality of photoelectric conversion elements 13a arranged in a prescribed manner. The surface shape of a light receiving surface is made to be different from that of the other receiving surfaces concerning a part of the photoelectric conversion elements 13a among the plurality of elements 13a. The shape is adopted as the index 20 for analyzing the defect. COPYRIGHT: (C)2008,JPO&INPIT
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