发明名称 Laser irradiation apparatus and laser irradiation method
摘要 The present invention provides a laser irradiation apparatus and a laser irradiation method which can reduce displacement of entrance point of laser light into a diffractive optical element, when laser light enters the diffractive optical element through a beam expander optical system. When the scale of laser light emitted from a laser oscillator is enlarged through a beam expander optical system including two lenses, and the laser light enters the diffractive optical element, the emission point of the laser light and the first and second lenses are arranged such that the positions of the emission point of the laser light and the second lens are conjugate to each other by the first lens.
申请公布号 US2008013170(A1) 申请公布日期 2008.01.17
申请号 US20070822783 申请日期 2007.07.10
申请人 SEMICONDUCTOR ENERGY LABORATORY CO., LTD. 发明人 TANAKA KOICHIRO
分类号 G02B11/02 主分类号 G02B11/02
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