发明名称 Bottom electrode contacts for semiconductor devices and methods of forming same
摘要 Bottom electrode contact structures for a semiconductor assembly and a method for forming same are described. An exemplary semiconductor device comprises electrode contact structures in a phase change memory device. The phase change memory device comprising a phase change cell is made up of a bottom electrode contact structure comprising a phase change material liner connecting between a conductive top electrode and a conductive bottom electrode where the resulting ultra-small contacts are determined by the intersection of the sidewall bottom electrode and the phase change liner.
申请公布号 US2008014733(A1) 申请公布日期 2008.01.17
申请号 US20060487209 申请日期 2006.07.14
申请人 MICRON TECHNOLOGY, INC. 发明人 LIU JUN
分类号 H01L21/44 主分类号 H01L21/44
代理机构 代理人
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