发明名称 Hot plate and process for producing the same
摘要 A hot plate for heating a substrate placed on the hot plate. The hot plate comprises a silicon base having pin insertion holes through which support pins for supporting a substrate from below and elevating the substrate above the hot plate pass; a heater composed of a resistor made of a metal film deposited on the back surface of the silicon base; and a temperature sensor, composed of a resistor made of a metal film deposited on the back or front surface of the silicon base. The front surface of the silicon base has gap-making protrusions for making a gap between the hot plate and a substrate placed on the gap-making protrusions.
申请公布号 US2008011737(A1) 申请公布日期 2008.01.17
申请号 US20070757641 申请日期 2007.06.04
申请人 TOKYO ELECTRON LIMITED 发明人 FUKUOKA TETSUO;KITANO TAKAHIRO
分类号 H05B3/68 主分类号 H05B3/68
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