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发明名称
装置基板之洗净方法
摘要
本发明系提供一种可充分除去附着于装置基板之光阻,尤其,附着于长宽比大之微细图案的孔部之光阻的装置基板之洗净方法。本发明之装置基板之洗净方法,系具备使用溶剂而除去附着于装置基板之光阻的洗净步骤,其特征在于:该溶剂为含有:至少一种选自由氢氟醚、氢氟碳化物及全氟碳化物所构成之群中的含氟化合物、与含氟醇之组成物。
申请公布号
TW200805005
申请公布日期
2008.01.16
申请号
TW096112102
申请日期
2007.04.04
申请人
旭硝子股份有限公司;NTT先进科技股份有限公司
发明人
冈本秀一;生津英夫
分类号
G03F7/42(2006.01);C11D7/50(2006.01);H01L21/027(2006.01);H01L21/304(2006.01)
主分类号
G03F7/42(2006.01)
代理机构
代理人
林志刚
主权项
地址
日本
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