| 摘要 |
830.391. Coating by vapour deposition. EDWARDS HIGH VACUUM Ltd. Oct. 22, 1956 [Oct. 28, 1955], No. 30944/55. Class 82(2) An apparatus for cathode sputtering a film of a given substance or substances on to a workpiece 7 comprises a vacuum chamber 1, a workpiece-supporting table 3 in said chamber adapted for rotation about a central perpendicular axis, a sector-shaped cathode or cathodes 5, 6 comprising said substance or substances respectively and supported in the vacuum chamber and spaced from said table along its axis of rotation, means for connecting the cathode(s) to a source of high potential, and means for effecting rotation of the table. The vacuum chamber may also contain a vapour source 11 for depositing films by evaporation. The term "cathode" is defined to include a pair of electrodes connected respectively to each pole of a single-phase A.C. source, and three electrodes connected respectively to the poles of a three-phase A.C. source. The enclosed angle # of the sector-shaped cathodes may vary from 10 to 180 degrees. Further, the cathodes may be shaped, e.g. to the forms 17 and 18 shown in Figs. 4a and 4b respectively. The following applications are disclosed: (a) the sputtering of iron oxide on to sun-glasses followed by the evaporation of magnesium fluoride or silicon monoxide, (b) the production of multi-layer interference filters incorporating alternate layers of reactively sputtered titanium oxide and evaporated magnesium fluoride, (c) the use of alternate layers of sputtered bismuth oxide and evaporated magnesium fluoride in interference filters and on the surfaces of imitation precious stones, and (d) the production of transparent conducting coatings on glass by reactively sputtering a metal oxide film from one cathode and then sputtering a gold film from another cathode. Reference is also made to the sputtering of nickel and reactive sputtering of cadmium oxide. Specification 610,529 is referred to.
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