发明名称 Method of nanostructuring the surface of a substrate
摘要 <p>The method involves forming implants (6), at dislocations, made of a material other than that of a crystalline zone (4) located near an interface (5) between surfaces of elements (1, 2), where the implants are obtained by thermally diffusing a metallic material deposited over a surface of a substrate (10). The substrate is irradiated with a pulsated/continuous electromagnetic wave to cause electromagnetic energy absorption at the implants, where the absorption leads to a periodic nanostructuration over the surface. A phase change material is deposited on the surface before the irradiation.</p>
申请公布号 EP1878694(A2) 申请公布日期 2008.01.16
申请号 EP20070112226 申请日期 2007.07.11
申请人 COMMISSARIAT A L'ENERGIE ATOMIQUE;UNIVERSITE JEAN-MONNET;CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE 发明人 FOURNEL, FRANK;MEZIERE JEROME;BAVARD, ALEXIS;PIGEON, FLORENT;GARRELIE, FLORENCE
分类号 B82B3/00;H01L21/18 主分类号 B82B3/00
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