发明名称 PHASE CHANGEABLE MATERIAL LAYER, METHOD OF FORMING PHASE CHANGEABLE MATERIAL LAYER AND METHODS OF MANUFACTURING A PHASE CHANGEABLE MEMORY DEVICE USING THE SAME
摘要 A phase changeable material layer, a method for forming the phase changeable material layer, and a method for manufacturing a phase changeable memory device are provided to improve a phase changing property of the phase changeable material layer by increasing a density of the phase changeable material layer. A plasma containing hydrogen plasma is formed in a reaction chamber where an object is loaded(S10). A first source gas containing a first material is supplied to the reaction chamber(S20), such that a first material film is formed on the object(S30). A second source gas containing a second material is supplied to the reaction chamber(S40), such that a first composite material film containing the first and second materials is formed on the object(S50). A third source gas containing a third material is supplied to the reaction chamber(S60), such that a third material film is formed on the first composite material film(S70). A fourth source gas containing a fourth material is supplied to the reaction chamber(S80), such that a second composite material film containing the third and fourth materials is formed on the object(S90).
申请公布号 KR20080006394(A) 申请公布日期 2008.01.16
申请号 KR20060065562 申请日期 2006.07.12
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 LEE, JIN IL;CHO, SUNG LAE;PARK, YOUNG LIM;PARK, HYE YOUNG
分类号 H01L21/8247 主分类号 H01L21/8247
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