发明名称 |
PHASE CHANGEABLE MATERIAL LAYER, METHOD OF FORMING PHASE CHANGEABLE MATERIAL LAYER AND METHODS OF MANUFACTURING A PHASE CHANGEABLE MEMORY DEVICE USING THE SAME |
摘要 |
A phase changeable material layer, a method for forming the phase changeable material layer, and a method for manufacturing a phase changeable memory device are provided to improve a phase changing property of the phase changeable material layer by increasing a density of the phase changeable material layer. A plasma containing hydrogen plasma is formed in a reaction chamber where an object is loaded(S10). A first source gas containing a first material is supplied to the reaction chamber(S20), such that a first material film is formed on the object(S30). A second source gas containing a second material is supplied to the reaction chamber(S40), such that a first composite material film containing the first and second materials is formed on the object(S50). A third source gas containing a third material is supplied to the reaction chamber(S60), such that a third material film is formed on the first composite material film(S70). A fourth source gas containing a fourth material is supplied to the reaction chamber(S80), such that a second composite material film containing the third and fourth materials is formed on the object(S90).
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申请公布号 |
KR20080006394(A) |
申请公布日期 |
2008.01.16 |
申请号 |
KR20060065562 |
申请日期 |
2006.07.12 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
LEE, JIN IL;CHO, SUNG LAE;PARK, YOUNG LIM;PARK, HYE YOUNG |
分类号 |
H01L21/8247 |
主分类号 |
H01L21/8247 |
代理机构 |
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