APPARATUS AND METHOD FOR ALIGNING SEMICONDUCTOR

摘要

An apparatus and a method for aligning a semiconductor are provided to perform more accurate wafer alignment and reduce unnecessary waste of a process time. A method for aligning a semiconductor includes the steps of: registering a first scope image of a specific portion of a wafer in a recipe as reference alignment information(S401); receiving a second scope image by scanning the specific portion of the alignment wafer(S403); and aligning the wafer(S407) so that the first scope image and the second scope image correspond to each other(S405). The first scope image and the second scope image are scanned by reflection light of a laser beam. The reference data is registered in the recipe at the time of setting up equipment.