| 摘要 |
A method and an apparatus for cleaning a substrate are provided to uniformly maintain a concentration distribution of a dry liquid by directly spraying the dry liquid on a substrate. A substrate cleaning apparatus comprises a substrate support member(110), a lower chamber(120), an upper chamber(130), and an indirect spray nozzle(140). The substrate support member includes a chuck on which a substrate is placed. An upper portion of the lower chamber is opened. The lower chamber is formed to surround the chuck. The upper chamber opens or closes the upper portion of the lower chamber by forming a dry process, while the substrate is isolated from outside. The indirect spray nozzle is implemented on an edge of the upper chamber and sprays the dry liquid toward a center of the upper chamber, such that the dry liquid is indirectly sprayed on the substrate.
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