发明名称 Method for manufacturing a semiconductor substrate having a copper wiring
摘要 <p>A metallic copper and resin composite body manufacturing method of forming a copper wiring layer that forms an inner layer circuit, establishing an insulating layer with a resin on said wiring layer, forming via holes which expose the copper surface under the insulative layer, and depositing a metal on the copper surface that is exposed at the bottom of the via holes. The method includes a step of: removing copper oxide which forms on the surface of the copper that is exposed in the bottom of the via holes using a phosphoric acid aqueous solution with a pH between 1 and 3. The method suppresses haloing is and via holes with excellent solder bonding are formed.</p>
申请公布号 EP1879436(A2) 申请公布日期 2008.01.16
申请号 EP20070112480 申请日期 2007.07.13
申请人 ROHM AND HAAS ELECTRONIC MATERIALS LLC 发明人 KONDO, MASAKI
分类号 H05K3/42;H05K3/26 主分类号 H05K3/42
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