发明名称 A METHOD OF DIRECT BONDING TWO SUBSTRATES USED IN ELECTRONICS, OPTICS, OR OPTOELECTRONICS
摘要 A method of direct bonding two substrates used in electronics, optics, or optoelectronics is provided to bond the substrates directly without an arbitrary intermediate layer. A method of direct bonding two substrates(1,2) used in electronics, optics, or optoelectronics includes the steps of: performing heat-treatment as preparation treatment prior to bonding on at least one of front faces(11,21) of two substrates for at least 30seconds at a temperature of 900°C ~ 1200°C, in a gaseous atmosphere including hydrogen and/or argon; and bonding directly together the respective front faces of the two substrates. One or both of the two substrates are made of semiconductor material. Further, the preparation treatment prior to bonding is performed at atmosphere containing Ar or H2 gas.
申请公布号 KR20080006490(A) 申请公布日期 2008.01.16
申请号 KR20070069696 申请日期 2007.07.11
申请人 S.O.I.TEC SILICON ON INSULATOR TECHNOLOGIES 发明人 RAYSSAC OLIVIER;BOURDELLE KONSTANTIN;MAZURE CARLOS
分类号 H01L21/60;H01L23/48 主分类号 H01L21/60
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