| 摘要 |
A reactor of an atomic layer deposition device is provided to prevent pollutants from being generated by preventing reaction residues from reacting with one another or accumulating around a gas inlet hole. A reactor of an atomic layer deposition device includes a reaction space(251), plural gas inlet holes(210,212), a gate outlet hole(220), a gas flow adjusting unit(205), and a reaction chamber. The reaction chamber includes a substrate support mount, which mounts a substrate in the reaction space. The gas flow adjusting unit is arranged between the gas inlet hole and the reaction space and includes plural gas inlet channels. A size of the gas inlet channel gets wider from one of the gas inlet hole to a first portion around the reaction space. |
