| 摘要 |
A pumping system in semiconductor device manufacturing equipment is provided to improve process efficiency by operating the pumping system according to a process specification. A pumping system in semiconductor device manufacturing equipment includes a vacuum pump unit(126) and a particle trapping unit. The vacuum pump unit is connected to a process chamber through exhaust lines(124a,124b,124c). The vacuum pump unit pumps air in the process chamber. The particle trapping unit is connected to the vacuum pump unit. The particle trapping unit filters particles contained in the air discharged from the process chamber. The particle trapping unit is composed of a hot trapping portion(134) and a cold trapping portion(136). Each of the hot trapping portion and the cold trapping portion is composed in at least one trapping portion. The vacuum pump unit includes a booster pump(130) and a dry pump(132). The dry pump is connected to a rear end of the booster pump.
|
