发明名称 Projection exposure apparatus and method, catadioptric optical system and manufacturing method of devices
摘要 A catadioptric optical system forms an image of a first surface onto a second surface. The system includes a first lens having a first optical axis, a combination of a concave mirror and a second lens, the combination having a second optical axis, a third lens having a third optical axis, a first reflection plane that is arranged in an optical path between the first lens and the combination, and a second reflection plane that is arranged in an optical path between the combination and the third lens. An intersection line of an extension plane of the first reflection plane and an extension plane of the second reflection plane is set up so that the first optical axis, the second optical axis and the third optical axis intersect at one point. In addition, at least one of the first lens and the third lens is movable.
申请公布号 US7319508(B2) 申请公布日期 2008.01.15
申请号 US20070878402 申请日期 2007.07.24
申请人 NIKON CORPORATION 发明人 OMURA YASUHIRO;SHIRAISHI NAOMASA;OWA SOICHI
分类号 G03B27/54;G02B13/24;G02B17/08;G03B27/42;G03F7/20 主分类号 G03B27/54
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